Nanoline 50-2C CD Measurement System

Nanometrics Application / Maintenance Training Classes

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OVERVIEW

Brumley South provides Nanometrics Application & Maintenance training:

Applications Level 1 Training

Upon successful completion of the course curriculum the student should have mastered the following course objectives:

State why you need to measure film thickness
Determine what is important in the measurement result
Describe the principles of optical metrology
Describe which technologies are available to measure film thickness
Describe the concept of Stage Recipe, Film Strategy, Wafer Recipe, and Cassette Recipe
Demonstrate use of the main screens and functions of N2000 software: Log in, Setup, Recipes, Processing, Database, etc.
Demonstrate loading a wafer, running a measurement in Manual Mode using an existing Film Strategy, and checking the results
Demonstrate creation of all the Stage Recipe types available for blanket wafers
Demonstrate creation of a Wafer Recipe that uses a radial Stage Recipe and an existing Film Strategy, and display the results and the wafer map
Demonstrate creation of a Cassette Recipe and run Cassette measurements
State the principles of Pattern Recognition: Die, Deskew, Die Map, Die Group (of sites), Site PR, Teach Score, Search Score
Demonstrate use of the N2000 pattern recognition functions
Demonstrate creation of a complete Stage Recipe for a patterned wafer
Describe the tips for selecting good pattern recognition images
Demonstrate ability to export measurement data and import recipes
Demonstrate the ability to export database and error logs
Demonstrate the ablity to Reference the tool using the Reference Chip
Describe why you need to measure critical dimension measurement
Describe the basic OCD measurement principles
Demonstrate measuring CD pads using an existing CD Film Strategy
Course Length: 3 days