Nanoline 50-2C CD Measurement System is critical dimension measurement and inspection system for etching and lithography process control.
Highly stable scanning microdensitometer design, with sub-micron CD metrology capability and better than 0.025 micron measurement precision.
System measures lines, spaces and contact holes.
Applications include semiconductor wafers, photomasks, magnetic heads and memory disks.
Autofocus ans easy-to-use software included.