REFURBISHED NANOSPEC 210 XP SCANNING UV - COMPUTERIZED THIN FILM MEASUREMENT SYSTEM

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The Nanometrics 210XP is a spectrophotometer used for the determinationof resist film thickness on Silicon.
It automatically scans through a range of wavelengths and determines the thickness of the film based on the reflectance of the light.

Specifications:

• Wavelength range: ~ 370 - 800 nm
• Measurable thickness range: ~ 100 A - 50 um
• Typical films measured: oxide, nitride, polysilicon, positive and negative resists, thick and thin films, and polyimide

Description:

• Deep UV light source that extends the measurement limit down to 100Å
• The refractive index can be entered by user as an option
• Detect underlayer film thickness
• Wafer stage that accommodates up to 6" wafer
• Computer system to replace Dumb Terminal monitor