Nanometrics - support, refurbishment, repair and upgrade design

Nanospec 210 XP Scanning UV-Computerized Thin Film Measurement System Refurbished

The Nanometrics 210XP is a spectrophotometer used for the determination of resist film thickness on silicon. It automatically scans through a range of wavelengths and determines the thickness of the film based on the reflectance of the light.

SPECIFICATIONS
  • Wavelength range: ~ 370 - 800 nm
  • Measurable thickness range: ~ 100 A - 50 um
  • Typical films measured: oxide, nitride, polysilicon, positive and negative resists, thick and thin films, and polyimide
  • Deep UV light source that extends the measurement limit down to 100Å
  • The refractive index can be entered by user as an option
  • Detect underlayer film thickness
  • Wafer stage that accommodates up to 6" wafer
  • Computer system to replace Dumb Terminal monitor
Valid XHTML Valid CSS Valid RSS