NANOSPEC 6100 - TABLETOP FILM ANALYSIS SYSTEM REFURBISHED

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The NanoSpec 6100 is a fast, low cost tabletop film thickness and mapping system that provides a broad range of measurement capabilities for thin film metrology.

The 6100 utilizes non-contact spectroscopic reflectometry to measure sites as small as 10~m in diameter on production wafers. The computerized sample stage coupled to a robust autofocus system enables automatic generation of film thickness uniformity maps.

The system will measure wafer substrates in the size range of 75 to 200mm and photomasks from 5 to 9 inches square.

The 6100 measures film thickness in the range of 200~ - 20~m with the visible light source (400 to 800nm halogen lamp) and 25~ - 20~m with optional UV light source (210 - 400nm deuterium lamp). The upper thickness range can be extended to 70~m with the thick film option. Optical constants n and k can be determined with the XMP option.

A variety of substrates are easily measured and mapped with the motorized, precision x-y sample stage with a resolution of better than 1~m. The high-resolution color graphics display provides contour and 3D film thickness mapping.