Estek 600 Wafer Inspection System Refurbished

Estek WIS - 600 Wafer Inspection System is designed to completely analyze substrates, films and oxides used in the manufacture of semiconductors.

To achieve this inspection capability, the instrument has two separate collection subsystems:

  • the Dark Channel (DC), which detects that scatter light when scanned by a laser beam, and
  • the Light Channel (LC), which detects defects that deflect light when scanned by a laser beam.

Sorting criteria are defined by the user. This flexibility allows the engineer to taylor programs for specific applications, depending on what information is desired for defect identification and proceess control.

SPECIFICATIONS
  • Dark and light channel system. Dark channel is used for detecting particles and any light scattering defects. Light channel is useful for detecting non-light scattering defects such as mounds, dimples and non uniformity. Detects specular flaws, including large particles, mounds, dimples, saw marks, grooves, fractures, slip, epi-spikes, small particles on large grained surfaces, particles buried in/under a film.
  • Detection 0.30 um or .20 um(optional) on Silicon at 95% capture rate. Verified by NIST Traceable Standards.
  • Remanufactured System to factory production specifications.
  • NIST Calibration.
  • Warranty 180 days, Parts and labor. Travel Expense not included.
  • Automatic cassette-to-cassette robotic wafer transport system.
  • 150 mm non-contaminating robotic wafer handling system with sorting capability.
  • Wis-600A model/ includes two random access indexers . Wafers per hour, 120.
  • Wis-600B model/ includes one random access indexer and 2 receive indexers . Wafers per hour, 360.
  • Wis-600C model/ includes two random access indexers and 4 receive indexers. Wafers per hour, 360.
  • Configured to run Fluoroware PA-72 Series Cassette
  • New Color Monitor to display wafers.
  • No haze reporting channel.
  • Data printer.
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